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Photoelastic Stress Analysis Surrounding Different Implant Designs Under Simulated Static Loading

Zanatta, Luiz Carlos Silveira MS*; Dib, Luciano Lauria DDS, PhD*; Gehrke, Sergio Alexandre DDS, PhD

Journal of Craniofacial Surgery: May 2014 - Volume 25 - Issue 3 - p 1068–1071
doi: 10.1097/SCS.0000000000000829
Scientific Foundations

Objective The proposal of this study was to use a photoelasticity method to analyze the stress dissipation in the bone surrounding an implant under simulated loading.

Materials and Methods Four implant systems with different internal connection designs were studied: conical connection (group 1), triangular connection (group 2), Morse taper (group 3), and internal hexagon (group 4). After the models’ inclusion in a photoelastic resin, they were subjected to static loads of 100, 150, and 200 N. The lengths of fringes that were generated were measured at the bone crest parallel to the neck of the implant and along the implant body, as well as the dissipation of force across the entire area of extension.

Results Lower stress was observed at the crestal bone in groups 1 and 3 with no significant increase (P < 0.05) in different levels of load, whereas the stress levels in groups 2 and 4 were observed to be higher with loads of all intensities with significant differences from the other groups (P < 0.05).

Conclusions The type of connection and the implant neck design influenced the dissipation of force. The conical-type connection exhibited better load dissipation in the neck area, regardless of the load applied on the implant.

From the *Postgraduate Program, Paulista University, São Paulo, Brazil; and †Catholic University of Uruguay, Montevideo, Uruguay.

Received October 12, 2013.

Accepted for publication January 31, 2014.

Address correspondence and reprint requests to Sergio Alexandre Gehrke, DDS, PhD, Rua Dr. Bozano, 571, 97015-001 Santa Maria (RS), Brazil; E-mail:

The authors report no conflicts of interest.

© 2014 by Mutaz B. Habal, MD.